File:Oxygen Plasma Cleaning.JPG

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DescriptionOxygen Plasma Cleaning.JPG	English: The surface of a MEMS device is cleaned with bright, blue Oxygen Plasma in a Plasma Etcher to rid it of carbon contaminants. (100mTorr, 50W RF)
Date	15 July 2010
Source	Own work
Author	Maxfisch

Maboudian Lab, UC Berkeley

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	23:21, 16 July 2010		2,592 × 3,456 (4.02 MB)	Maxfisch	{{Information \|Description={{en\|1=The surface of a MEMS device is cleaned with bright, blue Oxygen Plasma in a Plasma Etcher to rid it of carbon contaminants. (100mTorr, 50W RF)}} \|Source={{own}} \|Author=Maxfisch \|Date=2010-07-15 \|Permi

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Camera manufacturer	CASIO COMPUTER CO.,LTD.
Camera model	EX-Z85
Exposure time	1/25 sec (0.04)
F Number	f/3.1
ISO speed rating	200
Date and time of data generation	16:28, 15 July 2010
Lens focal length	6.3 mm
Orientation	Normal
Horizontal resolution	72 dpi
Vertical resolution	72 dpi
Software used	Microsoft Windows Photo Gallery 6.0.6001.18000
File change date and time	21:18, 15 July 2010
Y and C positioning	Co-sited
Exposure Program	Normal program
Exif version	2.21
Date and time of digitizing	16:28, 15 July 2010
Image compression mode	5.1760402377686
APEX exposure bias	0
Maximum land aperture	3.3 APEX (f/3.14)
Metering mode	Pattern
Light source	Unknown
Flash	Flash did not fire, compulsory flash suppression
Color space	sRGB
Custom image processing	Normal process
Exposure mode	Auto exposure
White balance	Auto white balance
Focal length in 35 mm film	38 mm
Scene capture type	Standard
Contrast	Normal
Saturation	Normal
Sharpness	Normal